RUTA Vacuum Pump Systems Applications and Accessories
Typical areas of application for RUTA pump systems are industry, research and chemistry. Here the focus is on processes for metal production and processing, drying and degassing, thermal treatment, coating in the area of semiconductor manufacture as well as surface refinement. RUTA pump systems are also used as backing pump sets for high vacuum systems in combination with diffusion pumps, turbomolecular pumps and cryo pumps.
Overview on the Types of Pump Systems
The RUTA pump systems described here have been designed for rough and medium vacuum operation, i.e. for the pressure range from atmospheric pressure down to 10-4 mbar (7.5 x 10-5 Torr). RUTA pump systems consist of a combination of individual pumps whereby Roots vacuum pumps are employed on the intake side. Further compression to atmospheric pressure may be performed either by oilsealed or dry-compressing vacuum pumps, liquid ring pumps or Roots vacuum pumps with pre-inlet cooling. All combinations may be equipped at suitable places with condensers.
The selection criteria for a RUTA pump system are as follows:
Pumping speed
Operating pressure
Process conditions
Characteristics of the media
Standards and regulations which depend on the area of application and the produced products.
Standard RUTA Pump Systems
Our Roots vacuum pumps WA, WS and RA or WAU and WSU with integrated bypass line or RA with external bypass line (RAU) are combined with oil-sealed backing pumps for conventional generation of the vacuum. Single stage arrangements are capable of delivering pumping speeds of 250 to 16000 m3/h (147.3 to 9424 cfm). Higher pumping speeds can be attained by paralleling several pumps. The attainable operating pressures depend on the number of pumping stages.
For higher pumping speeds or lower ultimate pressures, three or multistage pump systems equipped with single or two-stage backing pumps are available (see figure).
RUTA Pump Systems with Condensers
If vacuum systems must pump larger quantities of vapor or vapor-gas mixtures, it is economical to insert condensers which are cooled with water or a different coolant at a suitable place within the pump system. Cooled condensers are themselves effective partial pumps which condense most of the vapors from the pumped media. The downstream mechanical pumps will then only need to pump those gases which have not already condensed. The quantity of vapor present in each case determines the size of the condenser and the temperature at which it is operated. The size of the downstream pump is determined by the quantity of non-condensable gases, the required pressure and the required pump-down time for the system.
All pump systems of the WA/WAU and RA/RAU series may be equipped with one or several condensers. These are often used in the chemical industry. Here RUTA vacuum pump systems with condensers are not only used to generate a vacuum, but they are also often employed in the recovery of solvents. When installing one or several Roots pumps upstream of a condenser, low operating pressures and high condensation pressures can be attained. Thus the condenser may in many cases be operated with cooling water instead of brine. The vapor components pumped together with inert gases may be separated once more in an emission condenser on the exhaust side so that the quality of the exhaust gas can be maintained within close tolerance regarding its cleanness.
Dry-Compressing RUTA
Vacuum Pump Systems
Increasing environmental awareness, pumping of condensable vapors or high requirements regarding cleanness when pumping high quality media which must not be contaminated by other media for recycling, often requires the use of universal pumps where the pump chamber is free of operating agents (dry pumps).
Here Leybold offers two solutions:
Pump systems consisting of the ScrewLine screw vacuum pump developed specifically for the process industry in combination with one or several Roots vacuum pumps.
Single or multi-stage RUTA RAV vacuum pump systems, consisting of Roots vacuum pumps with preadmission
