RUTA Vacuum Pump Systems
Applications and Accessories
Typical areas of application for RUTA pump systems are industry,
research and chemistry. Here the focus is on processes for metal
production and processing, drying and degassing,
thermal treatment, coating in the area of semiconductor manufacture
as well as surface refinement. RUTA pump systems are also used as
backing pump sets for high vacuum systems in combination with
diffusion pumps, turbomolecular pumps and cryo pumps.
Overview on the Types of Pump Systems
The RUTA pump systems described here have been designed for rough
and medium vacuum operation, i.e. for the pressure range from
atmospheric pressure down to 10-4 mbar (7.5 x 10-5 Torr). RUTA pump
systems consist of a combination of individual pumps whereby Roots
vacuum pumps are employed on the intake side. Further compression to
atmospheric pressure
may be performed either by oilsealed or dry-compressing vacuum
pumps, liquid ring pumps or Roots vacuum pumps with pre-inlet
cooling. All combinations may be equipped at suitable places
with condensers.
The selection criteria for a RUTA pump system are as follows:
Pumping speed
Operating pressure
Process conditions
Characteristics of the media
Standards and regulations which depend on the area of
application and the produced products.
Standard RUTA Pump Systems
Our Roots vacuum pumps WA, WS and RA or WAU and WSU with integrated
bypass line or RA with external bypass line (RAU) are combined with
oil-sealed backing pumps for conventional generation of the vacuum.
Single stage arrangements are capable of delivering pumping speeds
of 250 to 16000 m3/h (147.3 to 9424 cfm). Higher pumping
speeds can be attained by paralleling several pumps. The attainable
operating pressures depend on the number of pumping stages.
For higher pumping speeds or lower ultimate pressures, three or
multistage pump systems equipped with single or two-stage backing
pumps are available (see figure).
RUTA Pump Systems with Condensers
If vacuum systems must pump larger quantities of vapor or vapor-gas
mixtures, it is economical to insert condensers which are cooled
with water or a different coolant at a suitable place within the
pump system. Cooled condensers are themselves effective partial
pumps
which condense most of the vapors from the pumped media. The
downstream mechanical pumps will then only need to pump those gases
which have not already condensed. The quantity of vapor
present in each case determines the size of the condenser and the
temperature at which it is operated. The size of the downstream pump
is determined by the quantity of non-condensable gases, the required
pressure and the required pump-down time for the system.
All pump systems of the WA/WAU and RA/RAU series may be equipped
with one or several condensers. These are often used in the
chemical industry. Here RUTA vacuum pump systems with condensers are
not only used to generate a vacuum, but they are also often employed
in the recovery of solvents. When installing one or several Roots
pumps upstream of a condenser, low operating pressures and high
condensation pressures can be attained. Thus the
condenser may in many cases be operated with cooling water instead
of brine. The vapor components pumped together with inert gases may
be separated once more in an emission condenser on the exhaust side
so that the quality of the exhaust gas can be maintained within
close tolerance regarding its cleanness.
Dry-Compressing RUTA
Vacuum Pump Systems
Increasing environmental awareness, pumping of condensable vapors or
high requirements regarding cleanness when pumping high quality
media which must not be contaminated by other media for recycling,
often requires the use of universal pumps where the pump chamber is
free of operating agents (dry pumps).
Here Leybold offers two solutions:
Pump systems consisting of the ScrewLine screw vacuum pump
developed specifically for the process industry in combination
with one or several Roots vacuum pumps.
Single or multi-stage RUTA RAV vacuum pump systems,
consisting of Roots vacuum pumps with preadmission
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